Planar cavity MEMS and related structures, methods of manufacture and design structures
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United States of America Patent
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Mar 27, 2018
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app pub date -
Oct 4, 2016
filing date -
Jun 25, 2010
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Abstract
A method of forming a Micro-Electro-Mechanical System (MEMS) includes forming a lower electrode on a first insulator layer within a cavity of the MEMS. The method further includes forming an upper electrode over another insulator material on top of the lower electrode which is at least partially in contact with the lower electrode. The forming of the lower electrode and the upper electrode includes adjusting a metal volume of the lower electrode and the upper electrode to modify beam bending.
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International Classification(s)
- H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....
- H01P:WAVEGUIDES; RESONATORS, LINES OR OTHER DEVICES OF ....
- B81C:PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE M....
- G06F:ELECTRIC DIGITAL DATA PROCESSING
- B81B:MICRO-STRUCTURAL DEVICES OR SYSTEMS, e.g. MICRO-ME....
- H01H:ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PR....
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