Structurally controlled deposition of silicon onto nanowires

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United States of America Patent

PATENT NO 9923201
SERIAL NO

14710103

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Abstract

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Provided herein are nanostructures for lithium ion battery electrodes and methods of fabrication. In some embodiments, a nanostructure template coated with a silicon coating is provided. The silicon coating may include a non-conformal, more porous layer and a conformal, denser layer on the non-conformal, more porous layer. In some embodiments, two different deposition processes, e.g., a PECVD layer to deposit the non-conformal layer and a thermal CVD process to deposit the conformal layer, are used. Anodes including the nanostructures have longer cycle lifetimes than anodes made using either a PECVD or thermal CVD method alone.

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Patent OwnerAddress
AMPRIUS TECHNOLOGIES INC1180 PAGE AVE FREMONT CA 94538

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bornstein, Jonathan Cupertino, US 17 381
Han, Song Foster City, US 94 2831
Liu, Zuqin Sunnyvale, US 24 886
Stefan, Constantin Ionel San Jose, US 7 102
Wang, Weijie Sunnyvale, US 84 469

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