Magnetic memory with tunneling magnetoresistance enhanced spacer layer

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United States of America Patent

PATENT NO 9923137
SERIAL NO

15060634

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Abstract

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A device and a method of forming a device are presented. A substrate is provided. The substrate includes circuit component formed on a substrate surface. Back end of line processing is performed to form an upper inter level dielectric (ILD) layer over the substrate. The upper ILD layer includes a plurality of ILD levels. A magnetic tunneling junction (MTJ) stack is formed in between adjacent ILD levels of the upper ILD layer. The MTJ stack comprises a free layer, a tunneling barrier layer and a fixed layer. The fixed layer includes a polarizer layer, a composite texture breaking layer which includes a ruthenium layer and a synthetic antiferromagnetic (SAF) layer.

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Patent Owner(s)

Patent OwnerAddress
GLOBALFOUNDRIES SINGAPORE PTE LTD60 WOODLANDS INDUSTRIAL PARK D STREET 2 SINGAPORE 738406

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Lee, Kangho San Diego, US 100 1983
Naik, Vinayak Bharat Singapore, SG 35 293
Tahmasebi, Taiebeh Singapore, SG 23 263

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