Structure and method for memory cell array

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United States of America Patent

PATENT NO 9923027
SERIAL NO

15624865

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Abstract

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A memory cell array structure includes memory cells arranged in m rows and n columns on a substrate, and n columns of first and second well regions with different conductivity types alternatively arranged along the column direction. Each of the memory cells includes first and second diodes. The first diode formed of a first doped region in the same column is disposed in the first well region. The second diode formed of a second doped region in the same column is disposed in the second well region. A third doped region having the conductivity type of the first well region is disposed in the first well region and is connected to the reset line of the same column. A fourth doped region having the conductivity type of the second well region is disposed in the second well region and is connected to the bit line of the same column.

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Patent Owner(s)

Patent OwnerAddress
SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION201203 18 ZHANGJIANG ROAD SHANGHAI PUDONG NEW AREA MUNICIPAL DISTRICT SHANGHAI CITY 201203
SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING) CORPORATION100176 BEIJING BEIJING DAXING DISTRICT ECONOMIC AND TECHNOLOGICAL DEVELOPMENT ZONE (YIZHUANG) 18 WENCHANG AVENUE MUNICIPAL DISTRICT BEIJING CITY 100176

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cao, Heng Shanghai, CN 65 2162
Chiu, Shengfen Shanghai, CN 9 20

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