Semiconductor device and manufacturing method thereof

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United States of America Patent

PATENT NO 9922865
SERIAL NO

14067335

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Abstract

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A semiconductor device and a manufacturing method thereof are provided. The semiconductor device includes: a deep trench in a substrate; a sidewall insulating film on a side surface of the deep trench; an interlayer insulating film on the sidewall insulating film; and an air gap in the interlayer insulating film.

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Patent Owner(s)

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SK KEYFOUNDRY INCCHEONGJU-SI

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Choi, Hyung Suk Cheongju-si, KR 9 305
Jung, Hyun Tae Cheongju-si, KR 12 29
Jung, Meng An Cheongju-si, KR 11 62
Kang, Pil Seung Cheongju-si, KR 2 24
Lee, Da Soon Cheongju-si, KR 10 74
Lee, Gil Ho Cheongju-si, KR 15 74
Min, Woo Sig Cheongju-si, KR 6 46
Park, Jeong Gyu Cheongju-si, KR 15 36

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