Plasma processing device
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Mar 20, 2018
Issued Date -
N/A
app pub date -
Oct 17, 2012
filing date -
Aug 30, 2012
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
The invention provides a plasma processing device, wherein the upper electrode and the lower electrode are in the vacuum chamber. The chip is placed in the lower electrode. The first plate is placed between the upper electrode and the lower electrode, and the first plate includes a plurality of first voids. The second plate is placed between the first plate and the lower electrode, and the second plate includes a plurality of second voids. The high frequency power is provided by the upper electrode and the lower electrode in the vacuum chamber, and the plasma is generated between the third plate and the upper electrode. The plasma is filtered by the third void, the first void, and the second void.
First Claim
Other Claims data not available
Family
International Classification(s)
- 2012 Application Filing Year
- H01J Class
- 2054 Applications Filed
- 1685 Patents Issued To-Date
- 82.04 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 3 Citation Count
- H01J Class
- 31.16 % this patent is cited more than
- 7 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Sep 20, 2025 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Sep 20, 2029 |
