Illumination system and illumination optical unit for EUV projection lithography
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United States of America Patent
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Mar 20, 2018
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N/A
app pub date -
Mar 11, 2016
filing date -
Sep 18, 2013
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Abstract
An illumination optical unit for EUV projection lithography guides illumination light toward an object field. A field facet mirror of the illumination optical unit has a multiplicity of individual mirrors which are switchable between at least two tilting positions. A pupil facet mirror of the illumination optical unit has a plurality of stationary pupil facets and is disposed downstream of the field facet mirror in the beam path of the illumination light. The pupil facets serve for the at least sectionally superimposing imaging of a group of the individual mirrors of the field facet mirror into the object field via a group-mirror illumination channel.
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