Exposure device and lighting unit

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United States of America Patent

PATENT NO 9921482
SERIAL NO

14902044

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Abstract

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The present invention relates to an exposure device which forms an image of a pattern on a mask onto a substrate with microlens arrays to expose the substrate, and reduces a size of an lighting unit which emits an exposure light. Microlens arrays include plural microlenses which are arranged two-dimensionally and arranged in a direction intersecting a movement direction. Lighting unit includes an LD array bar in which plural laser diodes are arranged, and lighting optical system which transforms plural emitted lights emitted from the plural laser diodes into an exposure flux having a slit form. The slit form spreads across plural pieces of the microlenses, and which, with respect to the movement direction, is limited in an area not reaching a microlens arranged in an adjacent row in the movement direction, and illuminates plural microlenses arranged in a row with an exposure light by the exposure light flux.

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Patent Owner(s)

Patent OwnerAddress
V TECHNOLOGY CO LTDKANAGAWA KANAGAWA

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hatanaka, Makoto Yokohama, JP 29 157
Kajimaya, Koichi Yokohama, JP 1 0
Mizumura, Michinobu Yokohama, JP 113 613

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