Positive-type photosensitive resin composition, and insulating film and OLED formed using the same

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United States of America Patent

PATENT NO 9921476
SERIAL NO

14347180

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Abstract

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This invention relates to a positive-type photosensitive resin composition which includes an alkali soluble polyimide resin, a diazide-based photosensitive compound and a sensitivity enhancer, and in which the use of a polyimide resin wherein the degree of imidization of imidized polyimide resin is 50˜75% exhibits a light transmittance of 95% or more in the visible light wavelength range (400˜650 nm) as well as high developability in a patterning process, and to an insulating film and an OLED formed using the same.

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Patent Owner(s)

Patent OwnerAddress
KOLON INDUSTRIES INC(MAGOK-DONG) 110 MAGOKDONG-RO GANGSEO-GU SEOUL 07793

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kim, Byoung Kee Yongin-si, KR 7 37
Park, Se Hyung Seongnam-si, KR 10 101

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