Mask blank and mask and fabrication method thereof

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United States of America Patent

PATENT NO 9921467
SERIAL NO

14954602

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Abstract

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A mask blank and a mask are provided. The mask blank includes a substrate, and an etching stop layer embedded in the substrate. The mask includes the mask blank with the embedded etching stop layer, and a plurality of recesses formed in the mask blank. The recess exposes the embedded etching stop layer.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD8 LI-HSIN RD 6 HSINCHU SCIENCE PARK HSINCHU 300-78

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Chun-Lang Tainan County, TW 55 312
Tu, Chih-Chiang Taoyuan, TW 85 480

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