Reflective mask, reflective mask blank and manufacturing method therefor
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
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Mar 20, 2018
Issued Date -
N/A
app pub date -
Mar 16, 2016
filing date -
Mar 16, 2016
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A reflective mask reducing reflection of out-of-band light. The reflective mask includes a light shielding frame formed in a mask region corresponding to a boundary region of a chip on a semiconductor substrate multiply exposed. The substrate of the light shielding frame includes a layer having a different refractive index or includes pores to change the path of incident out-of-band light to thereby suppress the out-of-band light from being reflected off the conductive film. The substrate also includes a layer having a different refractive index relative to out-of-band light reflected off the conductive layer. With the reflective mask of this configuration, influence on the wiring pattern dimension can be reduced and productivity of the semiconductors can be improved.
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International Classification(s)
- 2016 Application Filing Year
- G03F Class
- 1979 Applications Filed
- 1508 Patents Issued To-Date
- 76.21 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- G03F Class
- 0 % this patent is cited more than
- 7 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Sep 20, 2025 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Sep 20, 2029 |
