Apparatus, system and method for providing an end effector

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United States of America Patent

PATENT NO 9919430
SERIAL NO

15370125

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Abstract

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The disclosure provides an apparatus, system and method for providing an end effector. The end effector may be capable of accommodating semiconductor wafers of varying sizes, and may include: a wafer support; a bearing arm capable of interfacing with at least one robotic element, and at least partially bearing the wafer support at one end thereof; a plurality of support pads on the wafer support for physically interfacing with a one of the semiconductor wafers; and a low friction moving clamp driven bi-directionally along a plane at least partially provided by the bearing arm, wherein the low friction moving clamp retractably applies force to a proximal edge of the semiconductor wafer.

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Patent Owner(s)

Patent OwnerAddress
JABIL CIRCUIT INC10560 DR MARTIN LUTHER KING JR STREET N ST PETERSBURG FL 33716

International Classification(s)

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  • 2016 Application Filing Year
  • H01L Class
  • 27971 Applications Filed
  • 23507 Patents Issued To-Date
  • 84.05 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances20162017201820192020202120222023202420250255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bosboom, Jeroen St. Petersburg, US 31 31
Major, Tatiana Pankova St. Petersburg, US 6 16
Munro, Richard St. Petersburg, US 11 28
Naderi, Babak St. Petersburg, US 13 20

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Patent Citation Ranking

  • 8 Citation Count
  • H01L Class
  • 23.71 % this patent is cited more than
  • 7 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges3689997611243481558461392216162801 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 8081 - 9091 - 100100 +05001000150020002500300035004000450050005500600065007000750080008500900095001000010500

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