Illumination optical assembly for projection lithography
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United States of America Patent
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Mar 13, 2018
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Feb 22, 2017
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Sep 3, 2014
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Abstract
An illumination optical assembly for projection lithography serves for illuminating an illumination field, in which an object field of a downstream imaging optical assembly is arrangeable, with illumination light of an EUV light source. The illumination optical assembly has a pupil illumination unit, on which the illumination light impinges and which includes facets for illuminating a pupil in the illumination beam path with the illumination light with a predefined pupil intensity distribution. The pupil illumination unit is embodied such that a plurality of illumination channels of the pupil illumination unit illuminate only a part of the entire object field. This results in an illumination optical assembly in which an excessively high illumination intensity on the facets of the pupil illumination unit can be reduced.
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