Reflective optical element, and optical system of a microlithographic projection exposure apparatus

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United States of America Patent

PATENT NO 9915873
SERIAL NO

15160616

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Abstract

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A reflective optical element (50) having a substrate (52) and a multilayer system (51) that has a plurality of partial stacks (53), each with a first layer (54) of a first material and a second layer (55) of a second material. The first material and the second material differ from one another in refractive index at an operating wavelength of the optical element. Each of the partial stacks has a thickness (Di) and a layer thickness ratio (Γi), wherein the layer thickness ratio is the quotient of the thickness of the respective first layer and the partial stack thickness (Di). In a first section of the multilayer system, for at least one of the two variables of partial stack thickness (Di) and layer thickness ratio (Γi), the mean square deviation from the respective mean values therefor is at least 10% less than in a second section of the multilayer system.

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Patent Owner(s)

Patent OwnerAddress
CARL ZEISS SMT GMBHRUDOLF-EBER-STRASSE 2 OBERKOCHEN 73447

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Dier, Oliver Lauchheim, DE 13 33
Enkisch, Hartmut Aalen, DE 33 113
Grasse, Christian Garching, DE 3 0
Paul, Hans-Jochen Aalen, DE 17 94
Schicketanz, Thomas Aalen, DE 30 92
Strobel, Sebastian Aalen, DE 5 4
Weber, Joern Aalen, DE 10 26
Winter, Ralf Schwaebisch Gmuend, DE 11 10

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