Photomask including monitoring marks
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United States of America Patent
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Mar 13, 2018
Issued Date -
N/A
app pub date -
Mar 18, 2016
filing date -
Jul 17, 2015
priority date (Note) -
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Abstract
A photomask including monitoring marks is disclosed. In one aspect, the photomask includes a transparent substrate, a mask pattern formed on an upper surface of the transparent substrate, and a monitoring mark having a line width pattern shared with the mask pattern. The monitoring mark is configured to receive a laser beam so as to measure a power state of the laser beam.
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