Discrimination of low-atomic weight materials using scattering and stopping of cosmic-ray electrons and muons
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United States of America Patent
Stats
-
Mar 13, 2018
Issued Date -
N/A
app pub date -
Feb 26, 2015
filing date -
Feb 26, 2014
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
Techniques, systems, and devices are disclosed for constructing a scattering and stopping relationship of cosmic-ray charged particles (including cosmic-ray electrons and/or cosmic-ray muons) over a range of low-atomic-mass materials, and to detect and identify content of a volume of interest (VOI) exposed to cosmic-ray charged particles based on the constructed scattering and stopping relationship. In one aspect, a process for constructing a scattering-stopping relationship for a range of low-density materials exposed to cosmic-ray charged particles is disclosed. This technique first determines a scattering parameter and a stopping parameter for each material within the range of low-density materials exposed to charged particles from cosmic ray. The technique then establishes a scattering-stopping relationship of cosmic ray charged particles for the range of low-density materials based on the determined pairs of scattering and stopping parameters associated with the range of low-density materials.
First Claim
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International Classification(s)
- 2015 Application Filing Year
- G01N Class
- 11310 Applications Filed
- 8345 Patents Issued To-Date
- 73.79 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 1 Citation Count
- G01N Class
- 40.30 % this patent is cited more than
- 7 Age
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