Measuring system and measuring method
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United States of America Patent
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Mar 13, 2018
Issued Date -
N/A
app pub date -
Jun 23, 2016
filing date -
Jun 23, 2016
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In Force
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Abstract
System and method for measuring an aerial image are provided. The system may include a lighting unit for providing illuminating light to pass through a mask to form initial light. An imaging unit is configured for imaging the initial light to form imaging light. A beam splitting unit is for splitting the imaging light into projection light and reference light. A projection light is projected to a substrate to form a mask image in the substrate, and the substrate reflects the projection light to form first reflected light onto the beam splitting unit. A reflecting unit is for receiving the reference light to form second reflected light, and for projecting the second reflected light onto the beam splitting unit, the second reflected light and the first reflected light interfering with each other to form interference light. A measuring unit is for measuring an aerial image formed from the interference light.

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Patent Owner(s)
Patent Owner | Address | |
---|---|---|
SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION | 201203 18 ZHANGJIANG ROAD SHANGHAI PUDONG NEW AREA MUNICIPAL DISTRICT SHANGHAI CITY 201203 |
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- [Classification Symbol]
- [Patents Count]
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Jiang, Yuntao | Shanghai, CN | 4 | 4 |
Wu, Qiang | Shanghai, CN | 535 | 3977 |
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