-based single crystal substrate and method for producing same

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United States of America Patent

PATENT NO 9915010
SERIAL NO

14891513

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Abstract

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Provided is one embodiment which is a method for growing a β-Ga2O3-based single crystal which uses the EFG method and includes raising a Ga2O3 melt inside a crucible up to a die opening via a die slit such that a seed crystal is contacted with the Ga2O3-based melt in the opening of the die with a horizontal position of the seed crystal shifted in a width direction (W) from a center in the width direction (W) of the die, and pulling up the seed crystal contacting the Ga2O3-based melt so as to grown a β-Ga2O3 single crystal.

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Patent Owner(s)

Patent OwnerAddress
TAMURA CORPORATION1-19-43 HIGASHI-OIZUMI NERIMA-KU TOKYO 1788511

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Koshi, Kimiyoshi Tokyo, JP 13 22
Masui, Takekazu Tokyo, JP 7 14
Takizawa, Masaru Tokyo, JP 12 103

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