System architecture for combined static and pass-by processing
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United States of America Patent
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Mar 13, 2018
Grant Date -
Jun 27, 2013
app pub date -
Dec 27, 2012
filing date -
Dec 27, 2011
priority date (Note) -
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Abstract
Disclosed is a substrate processing system which enables combined static and pass-by processing. Also, a system architecture is provided, which reduces footprint size. The system is constructed such that the substrates are processed therein vertically, and each chamber has a processing source attached to one sidewall thereof, wherein the other sidewall backs to a complementary processing chamber. The chamber system can be milled from a single block of metal, e.g., aluminum, wherein the block is milled from both sides, such that a wall remains and separates each two complementary processing chambers.
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