Vapor-liquid contacting apparatuses and methods for removing contaminants from gas streams
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Mar 13, 2018
Issued Date -
N/A
app pub date -
Jun 28, 2013
filing date -
Jun 28, 2013
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
Vapor-liquid contacting apparatuses and methods for removing contaminants from gas streams are provided. In an embodiment, a vapor-liquid contacting apparatus includes a vortex contacting stage having a contacting zone bound by a wall and defining an axis, a radially inner region surrounding the axis, and a radially outer region adjacent the wall. The vapor-liquid contacting apparatus also includes a feed conduit configured to direct flow of a feed gas into the radially outer region of the contacting zone in a direction tangential to the axis to form a vortex. Further, the vapor-liquid contacting apparatus includes a liquid conduit configured to deliver a liquid absorbent stream to the radially inner region in the contacting zone.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully