Method for producing substrate for semiconductor light emitting elements, method for manufacturing semiconductor light emitting element, substrate for semiconductor light emitting elements, and semiconductor light emitting element
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United States of America Patent
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Mar 6, 2018
Grant Date -
Aug 25, 2016
app pub date -
Oct 9, 2014
filing date -
Oct 11, 2013
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Abstract
An upper surface of a substrate is etched using a first single-particle film as a mask. The first single-particle film is constituted of first particles having a first particle diameter. The upper surface of the substrate is etched using a second single-particle film as a mask. The second single-particle film is constituted of second particles having a second particle diameter. The second particle diameter is different from the first particle diameter.
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