Method for dissolving a silicon dioxide layer
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United States of America Patent
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Mar 6, 2018
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N/A
app pub date -
Nov 14, 2016
filing date -
Mar 25, 2013
priority date (Note) -
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Abstract
This disclosure relates to a method for dissolving a silicon dioxide layer in a structure, including, from the back surface thereof to the front surface thereof, a supporting substrate, the silicon dioxide layer and a semiconductor layer, the dissolution method being implemented in a furnace in which structures are supported on a support, the dissolution method resulting in the diffusion of oxygen atoms included in the silicon dioxide layer through the semiconductor layer and generating volatile products, and the furnace including traps suitable for reacting with the volatile products, so as to reduce the concentration gradient of the volatile products parallel to the front surface of at least one structure.
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