Low temperature poly-silicon thin film transistor, fabricating method thereof, array substrate and display device

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United States of America Patent

PATENT NO 9911618
SERIAL NO

15085217

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Abstract

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Embodiments of the present invention disclose a low temperature poly-silicon thin film transistor and a method of fabricating the same, an array substrate, and a display device. The low temperature poly-silicon thin film transistor comprises an active layer, a source and a drain, wherein the active layer comprises a source contact region, a drain contact region, and a channel region located between the source contact region and the drain contact region, the source is provided above and connected to the source contact region, the drain being provided above and connected to the drain contact region, and thicknesses of the source contact region and the drain contact region are both larger than that of the channel region.

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Patent Owner(s)

Patent OwnerAddress
BOE TECHNOLOGY GROUP CO LTD100015 NO 10 JIUXIANQIAO ROAD BEIJING CHAOYANG DISTRICT BEIJING CITY BEIJING CITY 100015
CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO LTDNO 1188 HEZUO RD (WEST ZONE) HI-TECH DEVELOPMENT ZONE CHENGDU SICHUAN 611731

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bao, Junping Beijing, CN 11 18
Li, Xinghua Beijing, CN 112 1729

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