Pattern decomposition for directed self assembly patterns templated by sidewall image transfer
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United States of America Patent
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Mar 6, 2018
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Jan 3, 2017
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Dec 3, 2015
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Abstract
After forming spacers over a hard mask layer using a sidewall image transfer process, a neutral material layer is formed on the portions of the hard mask layer that are not covered by the spacers. The spacers and the neutral material layer guide the self-assembly of a block copolymer material. The microphase separation of the block copolymer material provides a lamella structure of alternating domains of the block copolymer material.
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