Fabrication of semiconductor device using alternating high and low temperature layers

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United States of America Patent

PATENT NO 9911600
SERIAL NO

14878136

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Abstract

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A method for fabricating a III-nitride semiconductor body that includes high temperature and low temperature growth steps.

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Patent Owner(s)

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INFINEON TECHNOLOGIES AMERICAS CORP101 N SEPULVEDA BLVD EL SEGUNDO CA 90245

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Beach, Robert La Crescenta, US 153 6781
Bridger, Paul Altadena, US 28 266

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