Apparatus and method for examining a surface of a mask

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United States of America Patent

PATENT NO 9910065
SERIAL NO

15158779

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Abstract

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The present invention relates to apparatuses and methods for examining a surface of a test object, such as e.g. a lithography mask. In accordance with one aspect of the invention, an apparatus for examining a surface of a mask comprises a probe which interacts with the surface of the mask, and a measuring apparatus for establishing a reference distance of the mask from a reference point, wherein the measuring apparatus measures the reference distance of the mask in a measurement region of the mask which is not arranged on the surface of the mask.

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Patent Owner(s)

Patent OwnerAddress
CARL ZEISS SMT GMBHGERMANY COHEN OBERKOCHEN BADEN-WURTTEMBERG

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Baralia, Gabriel Dieburg, DE 9 25
Budach, Michael Hanau, DE 38 159
Edinger, Klaus Lorsch, DE 35 425
Hofmann, Thorsten Rodgau, DE 22 184
Szych, Pawel Munich, DE 4 1

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