Vapor deposition of LiF thin films

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United States of America Patent

PATENT NO 9909211
SERIAL NO

15186249

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Abstract

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A vapor deposition process for forming a thin film on a substrate in a reaction chamber where the process includes contacting the substrate with a fluoride precursor. The process results in the formation of a lithium fluoride thin film.

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ASM IP HOLDING B VVERSTERKERSTRAAT 8 ALMERE 1322 AP

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hämäläinen, Jani Epsoo, FI 6 65
Leskelä, Markku Espoo, FI 60 5948
Mäntymäki, Miia Helsinki, FI 3 20
Ritala, Mikko Espoo, FI 97 8656

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