Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom
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United States of America Patent
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Mar 6, 2018
Issued Date -
N/A
app pub date -
Jan 19, 2016
filing date -
Aug 12, 2011
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.
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Cited Art Landscape
Patent Citation Ranking
- 11 Citation Count
- C07D Class
- 94.24 % this patent is cited more than
- 7 Age
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