Apparatus and method for treating graphene using plasma and application thereof

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United States of America Patent

PATENT NO 9908779
SERIAL NO

14701471

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Abstract

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A method and apparatus for treating graphene raw material by plasma, and an application thereof are provided. After treated by the plasma, the graphene raw material will have a special structure and characteristic.

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Patent OwnerAddress
NATIONAL TAIWAN UNIVERSITYNO 1 SEC 4 ROOSEVELT ROAD TAIPEI 10617

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chang, Haoming Taipei, TW 2 2
Chen, Jian-Zhang Taipei, TW 3 3
Cheng, I-Chun Taipei, TW 5 5
Chou, Pi-Tai Taipie, TW 24 184
Hsu, Cheng-Che Taipei, TW 7 3
Liang, Sheng-Ping Taipei, TW 2 2
Liu, Hsiao-Wei Taipei, TW 5 38
Wu, Ting-Jui Taipei, TW 3 3

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