System and method for gas-phase passivation of a semiconductor surface

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United States of America Patent

PATENT NO 9905492
SERIAL NO

15397319

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Abstract

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Improved methods and systems for passivating a surface of a high-mobility semiconductor and structures and devices formed using the methods are disclosed. The method includes providing a high-mobility semiconductor surface to a chamber of a reactor and exposing the high-mobility semiconductor surface to a gas-phase sulfur precursor to passivate the high-mobility semiconductor surface.

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Patent Owner(s)

Patent OwnerAddress
ASM IP HOLDING B VVERSTERKERSTRAAT 8 ALMERE 1322 AP

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Givens, Michael E Scottsdale, US 13 4026
Raisanen, Petri Gilbert, US 59 17790
Tang, Fu Gilbert, US 46 7947
Xie, Qi Lueven, BE 127 19277

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