Methods, systems, and computer program product for implementing DRC clean multi-patterning process nodes with lateral fills in electronic designs
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United States of America Patent
Stats
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Feb 27, 2018
Issued Date -
N/A
app pub date -
Mar 31, 2015
filing date -
Mar 31, 2015
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
Disclosed are techniques for implementing DRC clean multi-patterning process nodes with lateral fills. These techniques identify design rules governing multi-patterning and track patterns by accessing a rule deck to retrieve the design rules, identify a first shape and a second shape sandwiching a space and characteristics of the first and second shapes by examining design data of the electronic design, insert one or more lateral fill shapes in the space by implementing the one or more lateral fill shapes along one or more routing tracks of a legal track pattern while automatically complying with the design rules, and perform post-lateral fill or post-layout operations to improve the layout and to prepare the layout for manufacturing.
First Claim
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Family
International Classification(s)
- 2015 Application Filing Year
- H01L Class
- 25498 Applications Filed
- 22451 Patents Issued To-Date
- 88.06 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 19 Citation Count
- H01L Class
- 87.83 % this patent is cited more than
- 7 Age
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