Lithographic apparatus and device manufacturing method

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United States of America Patent

PATENT NO 9904185
SERIAL NO

15333044

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Abstract

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A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B VP O BOX 324 VELDHOVEN 5500 AH
ASML HOLDING N VHOLLAND WEIDE EINDHOVEN VELDHOVEN NORTH BRABANT

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Belfroid, Stefan Philip Christiaan Delft, NL 19 570
Cox, Henrikus Herman Marie Eindhoven, NL 70 2067
De, Graaf Roelof Frederik Veldhoven, NL 58 378
Donders, Sjoerd Nicolaas Lambertus Vught, NL 253 8312
Hoogendam, Christiaan Alexander Westerhoven, NL 205 9950
Kemper, Nicolaas Rudolf Eindhoven, NL 95 1664
Leenders, Martinus Hendrikus Antonius Rhoon, NL 136 1474
Mertens, Jeroen Johannes Sophia Maria Duizel, NL 160 6273
Ottens, Joost Jeroen Veldhoven, NL 131 2979
Polizzi, Marco Eindhoven, NL 10 133
Smeulers, Johannes Petrus Maria Zwijndrecht, NL 21 716
Ten, Kate Nicolaas Almkerk, NL 157 972
Teunissen, Franciscus Johannes Herman Maria Rotterdam, NL 34 499
Van, Der Meulen Frits Eindhoven, NL 50 926
Van, Der Toorn Jan-Gerard Cornelis Eindhoven, NL 55 891
Van, Gompel Edwin Augustinus Matheus Veldhoven, NL 10 131
Verhagen, Martinus Cornelis Maria Valkenswaard, NL 51 1317
Vogel, Herman Sandy Hook, US 42 966

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