Interference lithography device

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United States of America Patent

PATENT NO 9904176
SERIAL NO

15145816

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Abstract

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An interference lithography device is provided with a laser source for providing a laser beam; a base thereon having a beam splitter for dividing the laser beam into a first beam portion and a second beam portion, a beam expander, a first set of reflectors, and a second set of reflectors; a set of lower reflectors; and a sample carrying stage for holding a substrate. The first beam portion and the second beam portion are respectively reflected from the second set of reflectors and then respectively reflected by the set of lower reflectors to form an interference pattern on the substrate.

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Patent Owner(s)

Patent OwnerAddress
NATIONAL SUN YAT-SEN UNIVERSITYNO 70 LIEN-HAI RD GUSHAN DISTRICT KAOHSIUNG CITY
LANDMARK OPTOELECTRONICS CORPORATIONNO 12 NANKE 9TH RD SHANHUA DIST TAINAN CITY

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hung, Yung-Jr Kaohsiung, TW 13 21
Lin, Wei Tainan, TW 588 4836

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