Reticle transmittance measurement method, projection exposure method using the same, and projection exposure device
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United States of America Patent
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Feb 27, 2018
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app pub date -
Jun 20, 2017
filing date -
Sep 30, 2014
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Abstract
When a reticle is first used, the reticle is loaded in a projection exposure device and measured by either oblique measurement or random measurement, thereby avoiding the fear of uneven sampling and determining the reticle transmittance of the entire reticle as the parent population, without increasing the sampling count. The same effect can be obtained by making the measurement spot size, which is fixed in general, variable and by changing the angle of incidence in relation to the measurement spot size.
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