Photomask blank, resist pattern forming process, and method for making photomask

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United States of America Patent

PATENT NO 9904169
SERIAL NO

15089788

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Abstract

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A photomask blank has a chemically amplified negative resist film comprising (A) a polymer comprising recurring units of specific structure and recurring units having fluorine, (B) a base resin adapted to reduce its solubility in alkaline developer under the action of acid, (C) an acid generator, and (D) a basic compound. The resist film is improved in receptivity to antistatic film.

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Patent Owner(s)

Patent OwnerAddress
SHIN-ETSU CHEMICAL CO LTDTOKYO JAPAN TOKYO METROPOLIS

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Adachi, Teppei Joetsu, JP 27 150
Domon, Daisuke Joetsu, JP 54 432
Masunaga, Keiichi Joetsu, JP 92 614
Watanabe, Satoshi Joetsu, JP 523 4776

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