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• 15 United States
• 10 France
• 8 Japan
• 7 China
• 5 Korea
• 2 Other

Patent Owner(s)

Patent Owner	Address
FUJIFILM CORPORATION	26-30 NISHIAZABU 2-CHOME MINATO-KU TOKYO 106-8620

International Classification(s)

• H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....
• C07D:HETEROCYCLIC COMPOUNDS
• C07C:ACYCLIC OR CARBOCYCLIC COMPOUNDS
• G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....
• C07J:STEROIDS

• [Classification Symbol]

• [Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Tsuchimura, Tomotaka	Shizuoka, JP	104	647

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Maintenance Fees

Fee	Large entity fee	small entity fee	micro entity fee	due date
7.5 Year Payment	$3600.00	$1800.00	$900.00	Aug 27, 2025
11.5 Year Payment	$7400.00	$3700.00	$1850.00	Aug 27, 2029

Fee	Large entity fee	small entity fee	micro entity fee
Surcharge - 7.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge - 11.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge after expiration - Late payment is unavoidable	$700.00	$350.00	$175.00
Surcharge after expiration - Late payment is unintentional	$1,640.00	$820.00	$410.00

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
February 27, 2018	US,9904167,B2   US9904167B2	GRANTED PATENT AS SECOND PUBLICATION
April 28, 2016	US,20160116840,A1   US20160116840A1	FIRST PUBLISHED PATENT APPLICATION

Full Text

US Patent No: 9904167

Compound, active light sensitive or radiation sensitive resin composition, resist film using same, resist-coated mask blank, photomask, pattern forming method, method for manufacturing electronic device, and electronic device

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