Glass substrate for mask blank
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United States of America Patent
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Feb 27, 2018
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app pub date -
Jan 21, 2016
filing date -
Feb 3, 2015
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Abstract
A glass substrate for a mask blank has main surfaces. A root-mean-square surface roughness (RMS) in at least one main surface is 0.15 nm or less. An aspect ratio of a surface profile (Str) of the main surface in accordance with ISO 25178-2:2012, where s=0.2, is 0.30 or more. The aspect ratio is determined through measurement of the surface profile at measurement intervals of 0.2 nm or less in a measurement range of 100 nm×100 nm using an atomic force microscope.
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