Fabrication of low defectivity electrochromic devices
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United States of America Patent
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Feb 27, 2018
Grant Date -
Nov 10, 2016
app pub date -
Jul 19, 2016
filing date -
Mar 31, 2009
priority date (Note) -
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status (Latency Note)
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Abstract
Prior electrochromic devices frequently suffer from high levels of defectivity. The defects may be manifest as pin holes or spots where the electrochromic transition is impaired. This is unacceptable for many applications such as electrochromic architectural glass. Improved electrochromic devices with low defectivity can be fabricated by depositing certain layered components of the electrochromic device in a single integrated deposition system. While these layers are being deposited and/or treated on a substrate, for example a glass window, the substrate never leaves a controlled ambient environment, for example a low pressure controlled atmosphere having very low levels of particles. These layers may be deposited using physical vapor deposition.
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International Classification(s)
- C23C:COATING METALLIC MATERIAL; COATING MATERIAL WITH M....
- C03C:CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREO....
- B05D:PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MAT....
- G09G:ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING....
- B23K:SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLA....
- G02B:OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
- G02F:DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF ....
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