Methods for depositing a monolayer on a substrate
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United States of America Patent
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Feb 20, 2018
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Apr 15, 2016
filing date -
Apr 17, 2015
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Abstract
Methods and compositions for depositing a monolayer onto a surface of a substrate are described. The method can include contacting the surface with a vapor phase comprising a carbene source, and reacting a carbene group from the carbene source with a functional group on the surface, to obtain a covalently bound monolayer on the surface of the substrate. The carbene source can be a diazirine compound. The functional group on the surface can be a C—H containing group, a Si—H containing group, among others, or combinations thereof. The method can further involve removing physisorbed molecules from the surface of the substrate.
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