Gas intake device of magnetron sputtering vacuum chamber and magnetron sputtering apparatus
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Feb 20, 2018
Issued Date -
N/A
app pub date -
Jan 23, 2015
filing date -
Jan 5, 2015
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A gas intake device of magnetron sputtering vacuum chamber and a magnetron sputtering apparatus with the gas intake device, the gas intake device of magnetron sputtering vacuum chamber comprises a gas mixing box configured to receive and mix the gas, a gas intake box configured to introduce the gas into a vacuum chamber, and a connecting pipe configured to connect with the two boxes, the gas mixing box has one or more gas intake pipes. The gas intake device can increase the distribution uniformity after the gas enters inside the vacuum chamber, effectively decrease the impact force to the precision equipment(s) in the vacuum chamber, and extend the service life of the apparatus.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully