Metallic nanomesh
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United States of America Patent
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Feb 20, 2018
Issued Date -
N/A
app pub date -
Jun 6, 2014
filing date -
Jun 24, 2013
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Abstract
A transparent flexible nanomesh having at least one conductive element and sheet resistance less than 300Ω/□ when stretched to a strain of 200% in at least one direction. The nanomesh is formed by depositing a sacrificial film, depositing, etching, and oxidizing a first metal layer on the film, etching the sacrificial film, depositing a second metal layer, and removing the first metal layer to form a nanomesh on the substrate.
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