Selective deposition of metals, metal oxides, and dielectrics

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United States of America Patent

PATENT NO 9895715
APP PUB NO 20150217330A1
SERIAL NO

14612784

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Abstract

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Methods are provided for selectively depositing a material on a first surface of a substrate relative to a second, different surface of the substrate. The selectively deposited material can be, for example, a metal, metal oxide, or dielectric material.

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Patent Owner(s)

Patent OwnerAddress
ASM IP HOLDING B VVERSTERKERSTRAAT 8 ALMERE 1322 AP

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Haukka, Suvi P Helsinki, FI 104 17903
Huotari, Hannu Helsinki, FI 48 7437
Matero, Raija H Helsinki, FI 30 4481
Niskanen, Antti Helsinki, FI 72 10468
Pore, Viljami J Helsinki, FI 66 9755
Raaijmakers, Ivo Bilthoven, NL 113 13612
Tois, Eva Helsinki, FI 50 6188
Tuominen, Marko Helsinki, FI 102 10592

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