Imprint method, imprint apparatus, and article manufacturing method
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United States of America Patent
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Feb 13, 2018
Issued Date -
N/A
app pub date -
Dec 8, 2016
filing date -
Oct 14, 2011
priority date (Note) -
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status (Latency Note)
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Abstract
An imprint apparatus forms a pattern of an imprint material on a substrate by using a mold. A substrate holding unit holds the substrate by a suction force between the substrate and a holding surface and includes a first suction unit for sucking a rear surface of a first region of the substrate with a first suction force and a second suction unit for sucking a rear surface of a second region of the substrate with a second suction force. A deformation mechanism deforms a shape of the first region in a direction along the holding surface when forming the pattern of the imprint material on the first region. An adjusting unit adjusts the first and second suction forces. The first suction force is less than the second in at least a portion of a period during the deforming of the shape of the first region by the deformation mechanism.
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International Classification(s)
- H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....
- B41L:APPARATUS OR DEVICES FOR MANIFOLDING, DUPLICATING,....
- B82Y:SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; ....
- B29C:SHAPING OR JOINING OF PLASTICS; SHAPING OF SUBSTAN....
- B29K:INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, ....
- G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....
- B29L:INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RE....
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