Use of surfactants having at least three short-chain perfluorinated groups in formulations for photo mask cleaning

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United States of America Patent

PATENT NO 9891520
SERIAL NO

14904018

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Abstract

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In a method for cleaning photo masks having patterns with smallest line-space dimensions below 200 nm, a surfactant composition A is used, wherein A contains at least three short-chain perfluorinated groups Rf selected from the group consisting of trifluoromethyl, pentafluoroethyl, 1-heptafluoropropyl, 2-heptafluoropropyl, and pentafluorosulfanyl and wherein A exhibits, at a 1% by weight aqueous solution, a static surface tension below 25 mN/m.

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Patent Owner(s)

Patent OwnerAddress
BASF SEGERMANY

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Honciuc, Andrei Wädenswil, CH 17 73
Klipp, Andreas Lambsheim, DE 44 551
Yang, Chu-Ya Zhongli, TW 3 11

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