Mask

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United States of America Patent

PATENT NO 9891518
SERIAL NO

14547399

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Abstract

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A mask, comprising an opaque region, a first semi-transparent region, and a second semi-transparent region. The transmittance of the second semi-transparent region is less than that of the first semi-transparent region. The mask solves the over-etching problem caused by the difference between the thicknesses of photoresist in different regions.

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Patent Owner(s)

Patent OwnerAddress
BOE TECHNOLOGY GROUP CO LTD100015 NO 10 JIUXIANQIAO ROAD BEIJING CHAOYANG DISTRICT BEIJING CITY BEIJING CITY 100015
BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO LTDNO 8 XIHUANZHONGLU BDA BEIJING 100176

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Qu, Lianjie Beijing, CN 81 160
Wang, Deshuai Beijing, CN 19 14

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