Optical measurement system, measurement method for errors of rotating platform, and two dimensional sine wave annulus grating
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United States of America Patent
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Feb 13, 2018
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Dec 7, 2015
filing date -
Dec 7, 2015
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Abstract
An optical measurement system including a two-dimensional sine wave annuls grating and a measurement unit is provided. The two-dimensional sine wave annuls grating includes a rotary shaft and a plurality of sine wave structures surrounding the rotary shaft and continuously arranged. The measurement unit is adapted to output a light beam towards the two-dimensional sine wave annuls grating, wherein each of the sine wave structures is adapted to reflect the light beam from the two-dimensional sine wave annuls grating back to the measurement unit. A measurement method for errors of a rotating platform and a two-dimensional sine wave annuls grating are also provided.
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