Resist composition, method of forming resist pattern, and polymeric compound

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United States of America Patent

PATENT NO 9890233
SERIAL NO

14596532

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Abstract

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A polymeric compound including a structural unit (a0) represented by general formula (a0-1) shown below and a polycyclic group-containing structural unit (a2m) other than the structural unit (a0), the structural unit (a2m) containing a lactone-containing polycyclic group, a —SO2-containing polycyclic group or a carbonate-containing polycyclic group, and a resist composition including the same:

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Patent Owner(s)

Patent OwnerAddress
TOKYO OHKA KOGYO CO LTD150 NAKAMARUKO NAKAHARA-KU KANAGAWA KAWASAKI-SHI 211-0012

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Endo, Kotaro Kawasaki, JP 66 607
Hirano, Tomoyuki Kawasaki, JP 119 1838
Iwasawa, Yuta Kawasaki, JP 19 34
Shinomiya, Miki Kawasaki, JP 4 5

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