High porosity mesoporous siliceous structures

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United States of America Patent

PATENT NO 9890047
SERIAL NO

14352423

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Abstract

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A process comprising: A) contacting one or more of sources of silicon oxide, selected from water soluble.silica sources arid alkali metal silicates, with an aqueous reaction medium, comprising one or more nonionic surfactants and thereby forming mesoporous structures comprising crosslinked silicon oxide units, wherein said crosslinked silicon oxide units have pores of about 1 to about 100 nanometers and wherein the aqueous reaction medium exhibits a pH of about 0 to about 4.0; B) exposing the aqueous reaction medium containing the mesoporous structures to elevated temperatures for a time sufficient to achieve the desired structure and pore size. Preferred water soluble silica sources comprise silicic acid, or polysilicic acids, The aqueous reaction, medium is prepared by combining one or more nonionic surfactants and water, theteby forming an aqueous, reaction medium, comprising micelles. Preferably, the aqueous reaction medium further comprises, a. micelle swelling agent capable of swelling micelles formed by the surfactant in the aqueous reaction medium. In one embodiment the process forms structures with struts comprised of crosslinked silicon oxides which connect at least some of the pore forming structures.

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Patent Owner(s)

Patent OwnerAddress
DOW GLOBAL TECHNOLOGIES LLC2040 DOW CENTER MIDLAND MI 48674

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kelly-Rowley, Anne M Midland, US 17 203
Kilos, Beata A Midland, US 18 10
Matteucci, Scott T Midland, US 65 262
Tucker, Christopher J Midland, US 55 534
Tway, Cathy L Midland, US 10 26

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