Method for recovering and purifying argon gas from silicon single crystal manufacturing apparatus and apparatus for recovering and purifying argon gas
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Feb 13, 2018
Grant Date -
Nov 10, 2016
app pub date -
Jan 14, 2015
filing date -
Jan 29, 2014
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
An argon gas recovering and purifying method including: introducing waste argon gas containing nitrogen, oxygen, and carbon monoxide from silicon single crystal manufacturing apparatus into waste argon gas storage tank; removing solid matters in pretreatment facility which removes the solid matters in waste argon gas; converting oxygen into water and converting carbon monoxide into carbon dioxide by catalytic reaction; removing the water, the carbon dioxide, and the nitrogen to obtain recovered gas, in the argon gas recovering and purifying method and an argon gas recovering and purifying apparatus, the catalytic reaction is carried out with compression heat alone by arranging a catalyst in a two-stage compressor, and the water is removed by a dryer in advance and then the nitrogen and the carbon dioxide are adsorbed and removed in an ordinary-temperature adsorption tower at the step of obtaining the recovered gas.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully