Porous nanomaterials having three-dimensional patterning
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United States of America Patent
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Feb 13, 2018
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Dec 11, 2013
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Dec 11, 2012
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Abstract
Provided are methods for imprinting a porous material, the methods including applying a first stamp to a porous material having an average pore size of less than about 100 μm, the first stamp having at least a first portion having a first height, a second portion having a second height and a third portion having a third height, wherein the first height, second height and third height are different.
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